The percentage rate at which a defect inspection
tool can find defects of a given size, for example
99.5% of .25 micron defects (also called sensitivity)
Computer Aided Transcription Software is the primary
fracturing and data viewing software used at all
Photronics facilities. This software, developed
by Transcription Enterprises, has the ability
to simulate complete jobdeck (mask layout) schemes
for the purposes of viewing the data prior to
the manufacturing process. It is widely used by
our customers for a variety of design checks.
CD Bias: The original and final CD values do not match, thus requiring process
manipulation to achieve. see CD
CD Linearity: The degree to which a small feature deviates from its intended size as
compared to a larger feature's deviation on the
CD Mean to Target: The difference between an average (mean) of a given set of CD readings
from the actual targeted value.
CD Nominal: Customer provided specifications to monitor the size of the geometry
within a pattern.
CD Process Push: The
ability to move a CD value from its written dimension
by manipulating the amount of develop time applied
at the process stage.
CD Range: The difference between the lowest and highest CD values within a given
set of readings.
CD Tolerance: A plus/minus value that dictates the allowable disparity between each
actual CD reading and a target value. The target
value may be either an absolute or mean number.
A specified )often plus/minus) value that dictates
the allowable difference between the lowest and
highest CD values within a given set of readings.
It can apply to either a mean or absolute value.
A design element in a hierarchical database.
Cellulose Acetate Nitrocellulose:
An organic material used as a pellicle membrane.
The degree to which a mask pattern or pellicle
is centered on a plate.
Character Rotation: Allows you to specify the degree that the characters of the mask title
have to be rotated for the appropriate appearance.
Chip Check: see Die-to-Database
The shiny metallic material that is used as a
light blocker on most masks.
Chrome Extension: A chrome defect that extends from an intended chrome edge.
Chrome Spot: A chrome defect that is isolated from any other chrome.
An abbreviation for Caltech Intermediate Format,
hierarchical pattern data format that is used
for mask layout. This software is "public
domain" meaning available for free without
The interference caused by placement of mask pattern
data at or very near to the clamps on a MEBES
substrate cassette or holder.
An area on the mask where the chrome has been
removed and there is only glass.
Clear Extension: A clear defect that extends into a chrome area from an intended clear
Clear Field: The background area surrounding the component geometry is clear, that
is, there is no chrome.
Code Layer: A layer or layers used to customize a base array of components. see Gate
Clock Start Date/Time: The date and time which Photronics Inc. receives all of the required
data from the customer.
Closure Check: Internal patterns written onto every mask used to monitor the accuracy
of the lithography equipment. Half of each pattern
is written at the beginning of the write process
and half is written at the end.
Abbreviation for complementary metal oxide semiconductor,
a common IC process.
C of C: Abbreviation for Certificate of Conformance, a quality document that
list the inspections required, the pass fail criteria
and the results for a specific mask.
Comp O: Comp O (ortho) controls the squareness of the patterns in the reticles.
Comp X: Comp X controls the height of the pattern along the X axis.
Comp Y: Comp Y controls the width of the pattern along the Y axis.
A container in which a photomask is stored. Compacts
come in a wide variety of sizes and colors to
accommodate different mask and pellicle sizes.
A process by which a large data file containing
highly repetitive structures can be reduced in
Particles, dirt or haze on a photomask.
Contract Date/Time: The date and time the finished product is quoted to be shipped to the
customer. This is not a quoted receipt date of
A lithography systems that use a laser to expose
the resist on a photomask blank, stands for Customer
Optical Reticle Engraver, various Core models
include 2000, 2100, 2100XP, 2500, 2564.
Corner Rounding: The degree to which feature corners that should be at sharp angles are
rounded by the lithography develop and etch processes.
Correlated Nominal: The correlation of the customer CD nominal with the difference between
Photronics Inc. and the customer CD nominal calibration
The delta determined from a correlation exercise,
most often refers to critical dimensions.
Correlation Exercise: A process by which the results from two different measurement tools are
compared to each other based upon readings from
a common artifact.
Cosmetic Grade: The tolerance for defect that may not affect the circuit geometry. These
defects include scratches on the chrome outside
of the array, damaged or partially removed AR,
or glass chips on the edges of the reticle.
A geometry or space used as a gauge to monitor
the pattern size and ensure that it is within
the customer's specification: Abbreviated: CD
The cumulative time from receipt of an order to